Characterization of screen printed and fire-through contacts on LPCVD based passivating contacts in monoPoly™ solar cells

被引:30
作者
Padhamnath, Pradeep [1 ,2 ]
Buatis, Jammaal Kitz [1 ]
Khanna, Ankit [1 ]
Nampalli, Nitin [1 ]
Nandakumar, Naomi [1 ]
Shanmugam, Vinodh [1 ]
Aberle, Armin G. [1 ,2 ]
Duttagupta, Shubham [1 ]
机构
[1] NUS, Solar Energy Res Inst Singapore, 6-01 Blk E3A,7 Engn Dr 1, Singapore 117574, Singapore
[2] Natl Univ Singapore, Dept ECE, 5-42 Blk E4,4 Engn Dr 3, Singapore 117583, Singapore
基金
新加坡国家研究基金会;
关键词
Metallization; Screen printing; Recombination; Passivation; Passivating contacts; Polysilicon; RECOMBINATION LOSSES; SI; QUALITY;
D O I
10.1016/j.solener.2020.03.087
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
In this work we have characterized screen-printed passivating contacts formed by different commercially available fire-through pastes on phosphorus doped (n(+)) polysilicon (poly-Si) layers at the rear side of monoPoly (TM) solar cells. Extremely low recombination current density under metal contacts (J(01,metal)) of 35-45 fA/cm(2) and excellent specific contact resistivity (rho(c)) values of similar to 1.3 m Omega-cm(2) are obtained for two different thicknesses of poly-Si (150 nm and 250 nm) used in this work. We demonstrate that, although the metal induced recombination increases with reducing thickness of the poly-Si layer, thinner poly-Si layers can lead to higher efficiencies on account of reduced parasitic absorption leading to higher cell current. A champion efficiency of 22.6% is reported for busbarless monoPoly (TM) cells with the best performing fire-through (FT) paste on large area (244.3 cm(2)) commercially available Czochralski grown Si wafers.
引用
收藏
页码:73 / 79
页数:7
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