Electrochromic WO3 thin films prepared by combining ion-beam sputtering deposition with post-annealing

被引：24

作者：

Xue, Jinxin ^{[1
]}

Zhu, Yiqi ^{[2
]}

Jiang, Meiping ^{[1
]}

Su, Jiangbin ^{[1
]}

Liu, Yang ^{[1
]}

机构：

[1] Changzhou Univ, Sch Math & Phys, Changzhou 213164, Peoples R China

[2] Jiangsu Univ Technol, Coll Elect & Commun Engn, Changzhou 213001, Peoples R China

来源：

MATERIALS LETTERS | 2015年 / 149卷

关键词：

WO3; Thin films; Electrochromic; Oxygen deficiency phase; Ion beam technology;

D O I：

10.1016/j.matlet.2015.02.100

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A method combining ion-beam sputtering deposition with post-annealing was proposed to prepare electrochromic WO3 thin films. It was observed that the intensity of oxygen deficiency phases can be controlled by adjusting the post-annealing temperature and time. It was also observed that as-prepared WO3 films exhibit excellent optical modulations up to 78-87%. With the increasing of oxygen deficiency intensity, the optical modulation increases accordingly. Further, the electrochromic mechanism of WO3 films was also discussed. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：127 / 129

页数：3

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