Optical Emission in Hexagonal SiGe Nanowires

被引:48
作者
Cartoixa, Xavier [1 ]
Palummo, Maurizia [2 ,3 ]
Hauge, Hakon Ikaros T. [4 ]
Bakkers, Erik P. A. M. [4 ]
Rurali, Riccardo [5 ]
机构
[1] Univ Autonoma Barcelona, Dept Engn Elect, E-08193 Barcelona, Spain
[2] Univ Roma Tor Vergata, Dipartimento Fis, Via Ric Sci 1, I-00133 Rome, Italy
[3] Univ Roma Tor Vergata, INFN, Via Ric Sci 1, I-00133 Rome, Italy
[4] TU Eindhoven, Dept Appl Phys, Den Dolech 2, NL-5612 AZ Eindhoven, Netherlands
[5] Inst Ciencia Mat Barcelona ICMAB CSIC, Campus Bellaterra, Barcelona 08193, Spain
关键词
Nanowires; hexagonal silicon; DFT; optical emission; DIELECTRIC-CONSTANT; LIGHT-EMISSION; DIRECT-BANDGAP; SILICON; DESIGN; ALLOYS;
D O I
10.1021/acs.nanolett.7b01441
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Recent advances in the synthetic growth of nanowires have given access to crystal phases that in bulk are only observed under extreme pressure conditions. Here, we use first-principles methods based on density functional theory and many-body perturbation theory to show that a suitable mixing of hexagonal Si and hexagonal Ge yields a direct bandgap with an optically permitted transition. Comparison of the calculated radiative lifetimes with typical values of nonradiative recombination mechanisms indicates that optical emission will be the dominant recombination mechanism. These findings pave the way to the development of silicon-based optoelectronic devices, thus far hindered by the poor light emission efficiency of cubic Si.
引用
收藏
页码:4753 / 4758
页数:6
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