Tailored Waveform of Dielectric Barrier Discharge to Control Composite Thin Film Morphology

Nanocomposite thin films of TiO2 in a polymer-like matrix are grown in a filamentary argon (Ar) dielectric barrier discharge (DBD) from a suspension of TiO2 nanoparticles in isopropanol (IPA). The sinusoidal voltage producing the plasma is designed to independently control the matrix growth rate and the transport of nanoparticle (NP) aggregates to the surface. The useful FSK (frequency shift keying) modulation mode is chosen to successively generate two sinusoidal voltages: a high frequency of 15 kHz and a low frequency ranging from 0.5 to 3 kHz. The coating surface coverage by the NPs and the thickness of the matrix are measured as a function of the FSK parameters. The duty cycle between these two signals is varied from 0 to 100%. It is observed that the matrix thickness is mainly controlled by the power of the discharge, which largely depends on the high-frequency value. The quantity of NPs deposited in the composite thin film is proportional to the duration of the low frequency applied. The FSK waveform has a double modulation effect, allowing us to obtain a uniform coating as the NPs are not affected by the high frequency and the matrix growth rate is limited when the low frequency is applied. When it is close to a frequency limit, the low frequency acts like a filter for the NP aggregates. The higher the frequency, the smaller the size of the aggregates transferred to the surface. By changing only the FSK modulation parameters, the thin film can be switched from superhydrophobic to superhydrophilic, and under suitable conditions, a nanocomposite thin film is obtained.