Laser ablation of boron carbide, thin-film deposition and plume analysis

被引：38

作者：

Kokai, F ^{[1
]}

Taniwaki, M

Takahashi, K

Goto, A

Ishihara, M

Yamamoto, K

Koga, Y

机构：

[1] Natl Inst Mat & Chem Res, JFCC, FCT Project, Tsukuba, Ibaraki 3058565, Japan

[2] Inst Res & Innovat, Kashiwa, Chiba 2770861, Japan

来源：

关键词：

boron carbide; thin film; pulsed laser deposition; time-resolved emission spectroscopy;

D O I：

10.1016/S0925-9635(00)00409-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of boron carbide were formed by pulsed laser deposition at room temperature using a sintered B4C target. The nature of the particulates embedded in the films and the composition and bonding states of the films varied depending on the laser fluence. The formation of non-stoichiometric amorphous films appeared to be dominated by the arrival of energetic B and C atomic species with expansion velocities of 1-30 km/s and the stability of chemical bonds. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：1412 / 1416

页数：5

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