Magnetic debris mitigation system for extreme ultraviolet sources

被引：15

作者：

Elg, Daniel T. ^{[1
]}

Sporre, John R. ^{[1
]}

Curreli, Davide ^{[1
]}

Shchelkanov, Ivan A. ^{[1
]}

Ruzic, David N. ^{[1
]}

Umstadter, Karl R. ^{[2
]}

机构：

[1] Univ Illinois, Ctr Plasma Mat Interact, Dept Nucl Plasma & Radiol Engn, Urbana, IL 61801 USA

[2] KLA Tencor Corp, Milpitas, CA 95035 USA

来源：

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2015年 / 14卷 / 01期

关键词：

extreme ultraviolet; collector; debris mitigation; magnetic mitigation; ionic debris; DESIGN; PLASMA;

D O I：

10.1117/1.JMM.14.1.013506

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In extreme ultraviolet (EUV) lithography, plasmas are used to generate EUV light. Unfortunately, these plasmas expel high-energy ions and neutrals which damage the collector optic used to collect and focus the EUV light. One of the main problems facing EUV source manufacturers is the necessity to mitigate this debris. A magnetic mitigation system to deflect ionic debris by use of a strong permanent magnet is proposed and investigated. A detailed computational model of magnetic mitigation is presented, and experimental results from an EUV source confirm both the correctness of the model and the viability of magnetic mitigation as a successful means of deflecting ionic debris. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)

引用

页数：7

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