Uniform design based SVM model selection for face recognition

被引:0
|
作者
Li Weihong [1 ]
Liu Lijuan [1 ]
Gong Weiguo [1 ]
机构
[1] Chongqing Univ, Educ Minist, Key Lab Optoelect Technol & Syst, Chongqing 400044, Peoples R China
来源
SECOND INTERNATIONAL CONFERENCE ON DIGITAL IMAGE PROCESSING | 2010年 / 7546卷
关键词
Support vector machine; Model selection; Face recognition; Leave-one-out; Uniform design; SUPPORT VECTOR MACHINES; CLASSIFICATION; OPTIMIZATION; PARAMETERS;
D O I
10.1117/12.852806
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Support vector machine (SVM) has been proved to be a powerful tool for face recognition. The generalization capacity of SVM depends on the model with optimal hyperparameters. The computational cost of SVM model selection results in application difficulty in face recognition. In order to overcome the shortcoming, we utilize the advantage of uniform design-space filling designs and uniformly scattering theory to seek for optimal SVM hyperparameters. Then we propose a face recognition scheme based on SVM with optimal model which obtained by replacing the grid and gradient-based method with uniform design. The experimental results on Yale and PIE face databases show that the proposed method significantly improves the efficiency of SVM model selection.
引用
收藏
页数:6
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