Formation of alpha and beta tantalum at the variation of magnetron sputtering conditions

被引：12
作者：
Nasakina, E. O. [1 ]
Sevostyanov, M. A. [1 ]
Mikhaylova, A. B. [1 ]
Baikin, A. S. [1 ]
Sergienko, K. V. [1 ]
Leonov, A. V. [1 ]
Kolmakov, A. G. [1 ]
机构：
[1] Inst Russian Acad Sci, AA Baikov Inst Met & Mat Sci, Leninsky Ave, Moscow, Russia
来源：
INTERNATIONAL SCIENTIFIC CONFERENCE ON RADIATION-THERMAL EFFECTS AND PROCESSES IN INORGANIC MATERIALS 2015 (RTEP2015) | 2016年 / 110卷
关键词：
composite materials; surface layer; tantalum; alpha and beta phase; nitinol; corrosion resistance; NANOSTRUCTURED ALPHA; NITI ALLOY; FILMS; TEMPERATURE; PARAMETERS; DEPOSITION;
D O I：
10.1088/1757-899X/110/1/012042
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Nano- and microdimensional surface layers of a and tantalum on flat NiTi, Ti, glass, etc. substrates were created. Structure and composition of samples were defined by SEM, AES and x-ray diffractometry. With increase in deposition time surface layer thickness not linearly increases. The transitional layer provide high adhesion of a surface layer to a substrate. Irrespective of summary sputtering time the beta phase is formed in the beginning and at sputtering time more than 20 min on it alpha tantalum is deposited, while temperature remains below 150 degrees C.
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页数：5
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