Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation

被引：3

作者：

Wang, Junwu ^{[1
]}

Wang, Xinbing ^{[1
]}

Zuo, Duluo ^{[1
]}

机构：

[1] Huazhong Univ Sci & Technol, Wuhan Natl Res Ctr Optoelect, Wuhan 430074, Peoples R China

来源：

FRONTIERS OF OPTOELECTRONICS | 2021年 / 14卷 / 03期

关键词：

extreme ultraviolet (EUV) radiation; laser induced discharge plasma; optical emission spectroscopy; electron temperature and density;

D O I：

10.1007/s12200-020-0964-8

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper, a CO2 laser induced discharge plasma extreme ultraviolet (EUV) source experimental device was established. The optical emission spectroscopy was used to diagnose the characteristics of the plasma, and the evolution of electron temperature and electron density with time was obtained. The influence of discharge voltage on plasma parameters was analyzed and discussed. The EUV radiation characteristics of the plasma were investigated by self-made grazing incidence EUV spectrometer. The EUV radiation intensity and conversion efficiency were discussed.

引用

页码：352 / 359

页数：8

共 28 条

[1] Spectral line selection for time-resolved investigations of laser-induced plasmas by an iterative Boltzmann plot method [J].

Aydin, Uemit ;

Roth, Peter ;

Gehlen, Christoph Dominic ;

Noll, Reinhard .

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2008, 63 (10) :1060-1065

[2] Laser-assisted vacuum arc extreme ultraviolet source: a comparison of picosecond and nanosecond laser triggering [J].

Beyene, Girum A. ;

Tobin, Isaac ;

Juschkin, Larissa ;

Hayden, Patrick ;

O'Sullivan, Gerry ;

Sokell, Emma ;

Zakharov, Vassily S. ;

Zakharov, Sergey V. ;

O'Reilly, Fergal .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (22)

[3] Spatial and temporal variations of electron temperatures and densities from EUV-emitting lithium plasmas [J].

Coons, R. W. ;

Harilal, S. S. ;

Polek, M. ;

Hassanein, A. .

ANALYTICAL AND BIOANALYTICAL CHEMISTRY, 2011, 400 (10) :3239-3246

[4] On the sn I and sn II stark broadening [J].

Djenize, S. ;

Sreckovic, A. ;

Nikolie, Z. .

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 2006, 39 (14) :3037-3045

[5] Laser Produced Plasma Light Source for EUVL [J].

Fomenkov, Igor V. ;

Ershov, Alex I. ;

Partlo, William N. ;

Myers, David W. ;

Sandstrom, Richard L. ;

Boewering, Norbert R. ;

Vaschenko, Georgiy O. ;

Khodykin, Oleh V. ;

Bykanov, Alexander N. ;

Srivastava, Shailendra N. ;

Ahmad, Imtiaz ;

Rajyaguru, Chirag ;

Golich, Daniel J. ;

De Dea, Silvia ;

Hou, Richard R. ;

O'Brien, Kevin M. ;

Dunstan, Wayne J. ;

Brandt, David C. .

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY, 2010, 7636

[6] SEMIEMPIRICAL FORMULAS FOR ELECTRON-IMPACT WIDTHS AND SHIFTS OF ISOLATED ION LINES IN PLASMAS [J].

GRIEM, HR .

PHYSICAL REVIEW, 1968, 165 (01) :258-+

[7] Extreme ultraviolet light sources and soft x-ray laser based on discharge produced plasma [J].

Hotta, Eiki ;

Sakai, Yusuke ;

Hayashi, Yasushi ;

Niimi, Gohta ;

Huang, Bin ;

Zhu, Qiushi ;

Song, Inho ;

Watanabe, Masato .

INTERNATIONAL CONFERENCE ON OPTICAL AND PHOTONIC ENGINEERING (ICOPEN 2015), 2015, 9524

[8]

Kieft ER, 2004, PHYS REV E, V70, DOI 10.1103/PhysRevE.70.066402

[9] Characterization of a vacuum-arc discharge in tin vapor using time-resolved plasma imaging and extreme ultraviolet spectrometry [J].

Kieft, ER ;

van der Mullen, JJAM ;

Kroesen, GMW ;

Banine, V ;

Koshelev, KN .

PHYSICAL REVIEW E, 2005, 71 (02)

[10] EUVL System - Moving Towards Production [J].

Meiling, Hans ;

Buzing, Nico ;

Cummings, Kevin ;

Harned, Noreen ;

Hultermans, Bas ;

de Jonge, Roel ;

Kessels, Bart ;

Kuerz, Peter ;

Lok, Sjoerd ;

Lowisch, Martin ;

Mallman, Joerg ;

Pierson, Bill ;

Wagner, Christian ;

van Dijk, Andre ;

van Setten, Eelco ;

Zimmerman, John .

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271

← 1 2 3 →