Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials

被引：46

作者：

Tarrio, C ^{[1
]}

Watts, RN

Lucatorto, TB

Slaughter, JM

Falco, CM

机构：

[1] NIST, Div Electron & Opt Phys, Gaithersburg, MD 20899 USA

[2] Univ Arizona, Dept Phys, Tucson, AZ 85721 USA

[3] Univ Arizona, Ctr Opt Sci, Tucson, AZ 85721 USA

来源：

APPLIED OPTICS | 1998年 / 37卷 / 19期

关键词：

D O I：

10.1364/AO.37.004100

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have performed angle-dependent reflectance measurements of in situ magnetron sputtered films of B4C, C, Mo, Si, and W. The Fresnel relations were used to determine the complex index of refraction from the reflectance data in the region of approximately 35-150 eV. In the cases of Si, C, and B4C we found excellent agreement with published data. However, for Mo and W we found that the optical properties from 35 to 60 eV differed significantly from those in the Literature.

引用

页码：4100 / 4104

页数：5

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