Nb doped SrTiO3 thin films deposited by pulsed laser ablation

被引：39

作者：

Fukushima, K ^{[1
]}

Shibagaki, S ^{[1
]}

机构：

[1] Sumitomo Met Ind Ltd, Adv Technol Res Labs, Amagasaki, Hyogo 660, Japan

来源：

THIN SOLID FILMS | 1998年 / 315卷 / 1-2期

关键词：

253 laser ablation; 462 surface morphology; 255 lattice parameters; 112 electrical properties;

D O I：

10.1016/S0040-6090(97)00752-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of Nb doped SrTiOx (Nb-STO) have been fabricated on SrTiO3 (100) substrates by a pulsed laser deposition (PLD) technique and characterized by XRD, AFM, XPS and electrical resistivity. It was found that the preferred orientation of the deposited Nb-STO films was a-axis at a substrate temperature of 650 degrees C and oxygen pressures lower than 3 X 10(-1) Torr. The effect of the oxygen pressure on film properties such as surface roughness, lattice constants and chemical composition have been investigated. As the oxygen pressure was decreased, the film surface morphology improved. Furthermore, the lattice constant of the a-axis increased with decreasing oxygen pressure, in spite of there being no change in the Nb content detected in Nb-STO films. (C) 1998 Elsevier Science S.A.

引用

页码：238 / 243

页数：6

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