Design and preparation of sub-wavelength antireflective structures on ZnS

被引：2

作者：

Xu Qi-Yuan ^{[1
]}

Liu Zheng-Tang ^{[1
]}

Li Yang-Ping ^{[1
]}

Wu Qian ^{[1
]}

Zhang Miao ^{[1
]}

机构：

[1] Northwestern Polytech Univ, State Key Lab Solidificat Proc, Xian 710072, Peoples R China

来源：

ACTA PHYSICA SINICA | 2011年 / 60卷 / 01期

关键词：

coupled-wave theory; antireflection of sub-wavelength structure; reactive ion etching; ZnS; FABRICATION; SURFACES; FILMS;

D O I：

10.7498/aps.60.014103

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

ZnS is one of the excellent materials that are used as long wave window in infrared, but the reflection of the surface is high. In order to reduce the reflection of the ZnS surface, we designed the sub-wavelength antireflective structure on ZnS by coupled-wave theory. The parameters of the sub-wavelength antireflective structure were optimiged and the twodimensional sub-wavelength antireflective structure on ZnS was fabricated by reactive ion etching technique. The results show that the transmittance of etched ZnS is significantly better than that of bare ZnS at wavelengths of 8-12 mu m. This is a new antireflection method using ZnS.

引用

页数：4

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