Run-to-run control charts with contrasts

被引：0

作者：

Runger, GC ^{[1
]}

Fowler, JW ^{[1
]}

机构：

[1] Arizona State Univ, Modeling & Anal Semicond Mfg Lab, Tempe, AZ 85287 USA

来源：

QUALITY AND RELIABILITY ENGINEERING INTERNATIONAL | 1998年 / 14卷 / 04期

关键词：

statistical process control; average run length; exponentially weighted moving average;

D O I：

10.1002/(SICI)1099-1638(199807/08)14:4<261::AID-QRE192>3.0.CO;2-R

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described. (C)1998 John Wiley & Sons, Ltd.

引用

页码：261 / 272

页数：12

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