OFI argon excimer amplifier for intense subpicosecond VUV pulse generation

被引:0
|
作者
Kaku, M. [1 ]
Kubodera, S. [1 ]
Oda, K. [1 ]
Katto, M. [2 ]
Yokotani, A. [2 ]
Miyanaga, N. [3 ]
Mima, K. [3 ]
机构
[1] Miyazaki Univ, Dept Elect & Elect Engn, Gakuen Kibanadai Nishi 1-1, Miyazaki 8892192, Japan
[2] Miyazaki Univ, Cooperat Res Ctr, Miyazaki 8892192, Japan
[3] Osaka Univ, Inst Laser Engn, Suita, Osaka 5650871, Japan
来源
XVII INTERNATIONAL SYMPOSIUM ON GAS FLOW, CHEMICAL LASERS, AND HIGH-POWER LASERS | 2009年 / 7131卷
关键词
VUV laser; high intensity laser; excimer laser; OFI plasma;
D O I
10.1117/12.820060
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have demonstrated an OFI Ar-2* excimer VUV amplifier at 126 nm pumped by a high-intensity laser in the table top size. We observed the Ar-2* excimer emission centered at 126 nm with the spectral bandwidth of 10 nm (FWHM), which was produced in the OFI plasma. Significant amplification was observed inside the OFI Ar-2* excimer as a result of the optical feedback provided by a VUV reflector. The gain-length product of 5.6 was observed at the Ar pressure of 11 atm. The population inversion density on the order of 10(17) cm(-3) was evaluated inside the OFI plasma, which would be sufficient for the amplification of a subpicosecond VUV pulse at 126 nm produced by the harmonic generation.
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页数:6
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