Growth and characterization of molybdenum oxide thin films prepared by photochemical metal-organic deposition (PMOD)

被引：49

作者：

Buono-Core, G. E. ^{[1
]}

Cabello, G. ^{[2
]}

Klahn, A. H. ^{[1
]}

Lucero, A. ^{[1
]}

Nunez, M. V. ^{[1
]}

Torrejon, B. ^{[1
]}

Castillo, C. ^{[1
]}

机构：

[1] Pontificia Univ Catolica Valparaiso, Inst Quim, Valparaiso, Chile

[2] Univ Bio Bio, Dept Ciencias Basicas, Concepcion, Chile

来源：

POLYHEDRON | 2010年 / 29卷 / 06期

关键词：

Molybdenum oxides; Thin films; Photochemical deposition; GAS-SENSING PROPERTIES; OPTICAL-PROPERTIES; SOL-GEL; TEMPERATURE;

D O I：

10.1016/j.poly.2010.01.036

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

Molybdenum oxide thin films have been successfully prepared by direct UV irradiation of amorphous films of a molybdenum dioxide acetylacetonate complex on Si(1 0 0) substrates. Photodeposited films were characterized by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). It was found that as-photodeposited films are uniform and smooth, with thickness of 350 nm, with rms surface roughness of 28 nm and contain non-stoichiometric oxides (MoO3-x). The results of XRD analysis showed that post-annealing of the films in air at 450 degrees C transforms the sub-oxides to alpha-MoO3 phase with a much rougher surface morphology (rms = 144 nm). The as-photodeposited MoO3-x films are amorphous, and exhibit better optical quality than annealed films. (C) 2010 Elsevier Ltd. All rights reserved.

引用

页码：1551 / 1554

页数：4

共 31 条

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