Characteristic evaluation of electroless nickel-phosphorus deposits with different phosphorus contents

被引:61
|
作者
Yoon, Jeong-Won
Park, Jong-Hyun
Shur, Chang-Chae
Jung, Seung-Boo
机构
[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
[2] Samsung Elect Co Ltd, Yongin 449711, Gyeonggi Do, South Korea
关键词
electroless nickel-phosphorus (EN-P); Pb-free solder; Sn-Ag solder; electroless nickel-immersion gold (ENIG); interfacial reaction;
D O I
10.1016/j.mee.2007.05.057
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The surface morphology, electrical property and reaction with solder alloy of two electroless nickel-phosphorus (EN-P) deposits (Ni 7wt.%P and Ni-10wt.%P) were investigated in this study. The P content of the EN-P layer decreased with increasing pH value. The ENP plating layers had an amorphous structure and the electrical resistivity of the layer increased with increasing P content. Reaction layers of Ni3Sn4, Ni2SnP and Ni3P formed at the interfaces between the Sn-3.5Ag solder and the two EN-P deposit layers. The thickness of the interfacial Ni3Sn4 intermetallic compound (IMC) layer in the Sn-3.5Ag/Ni-7wt.`/`P joint was thicker than that in the Sn-3.5Ag/Ni-10wt.%P joint, whereas the thickness of the Ni3P layer increased with increasing P content. These study results confirmed that the interfacial reaction between solder and the EN-P layer is significantly affected by the composition (P content) of the EN-P layer. (C) 2007 Published by Elsevier B.V.
引用
收藏
页码:2552 / 2557
页数:6
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