Influence of nitrogen on the defects and magnetism of ZnO:N thin films

被引:47
作者
Wu, Ke Yue [1 ,2 ]
Fang, Qing Qing [1 ,2 ]
Wang, Wei Na [1 ,2 ]
Zhou, Chang [1 ,2 ]
Huang, Wen Juan [1 ,2 ]
Li, Jin Guang [1 ,2 ]
Lv, Qing Rong [1 ,2 ]
Liu, Yan Mei [1 ,2 ]
Zhang, Qi Ping [1 ,2 ]
Zhang, Han Ming [1 ,2 ]
机构
[1] Anhui Univ, Sch Phys & Mat Sci, Hefei 230039, Peoples R China
[2] Anhui Univ, Key Lab Optoelect Informat Acquisit & Manipulat, Minist Educ, Hefei 230039, Peoples R China
关键词
ferromagnetic materials; II-VI semiconductors; interstitials; nitrogen; photoluminescence; Raman spectra; semiconductor doping; semiconductor thin films; vacancies (crystal); wide band gap semiconductors; zinc compounds;
D O I
10.1063/1.3468690
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nitrogen (N)-doped ZnO thin films have been deposited on Si (100) substrates by pulsed laser deposition under different N-2 pressures. The optical and magnetic properties of N-doped ZnO films have been studied with photoluminescence, Raman spectroscopy, and vibrating sample magnetometer. Photoluminescence and Raman studies reveal that N-2 pressure affected the defects of N-doped ZnO films. Under 10 Pa N-2 pressure, N substitutes O and forms N-O acceptor. Zn interstitials are main compensating donors. Under higher N-2 pressures, N not only substitutes O but also forms N2O molecules in N-doped ZnO films. Zn antisizes are compensating donors. In additional, Zn vacancies are formed and the concentration increases with increasing N-2 pressure. Magnetic properties of these films show that there are two distinct ferromagnetic mechanisms: the origin of ferromagnetism in the ZnO:N-10 Pa film is Zn interstitial, while Zn vacancy leads to ferromagnetism in the ZnO:N-50 Pa film. (c) 2010 American Institute of Physics. [doi:10.1063/1.3468690]
引用
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页数:5
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