Interdiffusion in as-deposited Ni/Ti multilayer thin films analyzed by atom probe tomography

被引：26

作者：

Aboulfadl, Hisham ^{[1
,3
]}

Seifried, Fabian ^{[2
]}

Stueber, Michael ^{[2
]}

Muecklich, Frank ^{[1
]}

机构：

[1] Saarland Univ, Chair Funct Mat, D-66123 Saarbrucken, Germany

[2] Karlsruhe Inst Technol, Inst Appl Mat, D-76344 Eggenstein Leopoldshafen, Germany

[3] Chalmers Univ Technol, Dept Phys, S-41296 Gothenburg, Sweden

来源：

MATERIALS LETTERS | 2019年 / 236卷

关键词：

Diffusion; Thin films; Amorphous materials; Atom probe; X-RAY-DIFFRACTION;

D O I：

10.1016/j.matlet.2018.10.085

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The nanoscale design of metallic multilayer thin films is one crucial factor that greatly influences the kinetics, often inducing unusual phase transformations. Metastable or amorphous phases may directly form in as-deposited films of certain thicknesses, which is common for Ni/Ti multilayers. Atom probe tomography and X-ray diffraction analyses are performed here to study the interdiffusion and structural changes as a function of the bilayer thickness in Ni/Ti multilayers. The films are deposited by DC magnetron sputtering with near 50:50 compositions. Multilayers with 5 nm bilayer thickness are found to be highly intermixed, with compositions up to similar to 25 at.% for both diffuser metals, inducing amorphization reactions during deposition. (C) 2018 Elsevier B.V. All rights reserved.

引用

页码：92 / 95

页数：4

共 14 条

[1] Atomic scale analysis of phase formation and diffusion kinetics in Ag/Al multilayer thin films [J].

Aboulfadl, Hisham ;

Gallino, Isabella ;

Busch, Ralf ;

Muecklich, Frank .

JOURNAL OF APPLIED PHYSICS, 2016, 120 (19)

[2] Reactive Ni/Ti nanolaminates [J].

Adams, D. P. ;

Rodriguez, M. A. ;

McDonald, J. P. ;

Bai, M. M. ;

Jones, E., Jr. ;

Brewer, L. ;

Moore, J. J. .

JOURNAL OF APPLIED PHYSICS, 2009, 106 (09)

[3] Phase transformations in Ni/Ti multilayers investigated by synchrotron radiation-based x-ray diffraction [J].

Cavaleiro, A. J. ;

Ramos, A. S. ;

Martins, R. M. S. ;

Fernandes, F. M. Braz ;

Morgiel, J. ;

Baehtz, C. ;

Vieira, M. T. .

JOURNAL OF ALLOYS AND COMPOUNDS, 2015, 646 :1165-1171

[4] Alloying process of sputter-deposited Ti/Ni multilayer thin films [J].

Cho, H. ;

Kim, H. Y. ;

Miyazaki, S. .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2006, 438 (699-702) :699-702

[5] DEVELOPMENT OF NI TI MULTILAYER SUPERMIRRORS FOR NEUTRON OPTICS [J].

ELSENHANS, O ;

BONI, P ;

FRIEDLI, HP ;

GRIMMER, H ;

BUFFAT, P ;

LEIFER, K ;

SOCHTIG, J ;

ANDERSON, IS .

THIN SOLID FILMS, 1994, 246 (1-2) :110-119

[6] DIFFUSION AND REACTIONS IN THIN-FILMS [J].

GREER, AL .

APPLIED SURFACE SCIENCE, 1995, 86 (1-4) :329-337

[7] Interdiffusion in metallic multilayers [J].

Greer, AL .

DEFECT AND DIFFUSION FORUM, 1997, 143 :557-567

[8] AMORPHIZATION ALONG INTERFACES AND GRAIN-BOUNDARIES IN POLYCRYSTALLINE MULTILAYERS - AN X-RAY-DIFFRACTION STUDY OF NI/TI MULTILAYERS [J].

HOLLANDERS, MA ;

THIJSSE, BJ ;

MITTEMEIJER, EJ .

PHYSICAL REVIEW B, 1990, 42 (09) :5481-5494

[9] Review of the fundamentals of thin-film growth [J].

Kaiser, N .

APPLIED OPTICS, 2002, 41 (16) :3053-3060

[10] Interdependence of elastic strain and segregation in metallic multilayers: An x-ray diffraction study of (111) Au/Ni multilayers [J].

Labat, S ;

Gergaud, P ;

Thomas, O ;

Gilles, B ;

Marty, A .

JOURNAL OF APPLIED PHYSICS, 2000, 87 (03) :1172-1181

← 1 2 →