Texturisation of multicrystalline silicon solar cells by RIE and plasma etching

被引：64
作者：
Nositschka, WA
Voigt, O
Manshanden, P
Kurz, H
机构：
[1] Univ Aachen, Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany
[2] Netherlands Energy Res Fdn, ECN, NL-1755 ZG Petten, Netherlands
来源：
SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2003年 / 80卷 / 02期
关键词：
texturisation; RIE; plasma etching; multicrystalline; silicon;
D O I：
10.1016/j.solmat.2003.06.003
中图分类号：
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号：
0807 ; 0820 ;
摘要：
Texturing by reactive ion etching (RIE) is demonstrated as an attractive technical solution for lowering of reflectance of multicrystalline silicon solar cells. A suitable sequence of processes is developed to combine the advantage of reactive ion etching with "natural lithography" based on colloidal masks. The RIE single-wafer texturisation is driven to an industrial applicable batch process by plasma etching with a gain in efficiency of 0.3% absolute. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：227 / 237
页数：11
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