Design and fabrication of double-cavity tunable filter using micromachined structure

被引：3

作者：

Janto, W ^{[1
]}

Amano, T ^{[1
]}

Koyama, F ^{[1
]}

Matsutani, A ^{[1
]}

Kondo, T ^{[1
]}

Arai, M ^{[1
]}

机构：

[1] Tokyo Inst Technol, Microsyst Res Ctr, Precis & Intelligence Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2003年 / 42卷 / 7B期

关键词：

micromachined filter; tunable filter; double cavity; crosstalk; shape factor;

D O I：

10.1143/JJAP.42.L828

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We propose a micromachined tunable optical filter with a double-cavity structure, which exhibits a sharper and flatter filter response than a conventional single-cavity filter, resulting in lower interchannel crosstalk and lower insertion loss. The possibility of using widely tunable filters in 200-GHz-spacing wavelength-division-multiplexing (WDM) systems is presented. In addition, a lower tuning voltage can be achieved with thinner movable cantilevers. We have fabricated a double-cavity filter with 7.5-pair top, 23.5-pair middle and 3.5-pair bottom GaAs/GaAlAs multilayer mirrors. The filter provides a better shape factor of reflection spectra of 0.41 than a single-cavity filter.

引用

页码：L828 / L830

页数：3

共 7 条

[1]

JANTO W, UNPUB JPN J APPL PHY

[2] Vertical and smooth etching of InP by Cl2/Xe inductively coupled plasma [J].