Junction-Level Thermal Analysis of 3-D Integrated Circuits Using High Definition Power Blurring

被引:17
|
作者
Melamed, Samson [1 ]
Thorolfsson, Thorlindur [2 ]
Harris, T. Robert [3 ]
Priyadarshi, Shivam [4 ]
Franzon, Paul [4 ]
Steer, Michael B. [4 ]
Davis, W. Rhett [4 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan
[2] Synopsys Inc, Mountain View, CA 94043 USA
[3] Dot Metr Technol Inc, Charlotte, NC 28223 USA
[4] N Carolina State Univ, Dept Elect & Comp Engn, Raleigh, NC 27695 USA
基金
美国国家科学基金会;
关键词
3-D integrated circuits (3DICs); measurement; Power Blurring method; silicon-on-insulator (SOI); simulation; thermal analysis; through-silicon vias (TSVs); CONDUCTIVITY; SIMULATION;
D O I
10.1109/TCAD.2011.2180384
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
The degraded thermal path of 3-D integrated circuits (3DICs) makes thermal analysis at the chip-scale an essential part of the design process. Performing an appropriate thermal analysis on such circuits requires a model with junction-level fidelity; however, the computational burden imposed by such a model is tremendous. In this paper, we present enhancements to two thermal modeling techniques for integrated circuits to make them applicable to 3DICs. First, we present a resistive mesh-based approach that improves on the fidelity of prior approaches by constructing a thermal model of the full structure of 3DICs, including the interconnect. Second, we introduce a method for dividing the thermal response caused by a heat load into a high fidelity "near response" and a lower fidelity "far response" in order to implement Power Blurring high definition (HD), a hierarchical thermal simulation approach based on Power Blurring that incorporates the resistive mesh-based models and allows for junction-level accuracy at the full-chip scale. The Power Blurring HD technique yields approximately three orders of magnitude of improvement in memory usage and up to six orders of magnitude of improvement in runtime for a three-tier synthetic aperture radar circuit, as compared to using a full-chip junction-scale resistive mesh-based model. Finally, measurement results are presented showing that Power Blurring high definition (HD) accurately determines the shape of the thermal profile of the 3DIC surface after a correction factor is added to adjust for a discrepancy in the absolute temperature values.
引用
收藏
页码:676 / 689
页数:14
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