RF Performance Investigation of β-Ga2O3/Graphene and β-Ga2O3/Black Phosphorus Heterostructure MOSFETs

被引:20
|
作者
Yadava, Narendra [1 ]
Chauhan, R. K. [1 ]
机构
[1] Madan Mohan Malaviya Univ Technol, Dept Elect & Commun Engn, Gorakhpur 273010, Uttar Pradesh, India
关键词
SEMICONDUCTOR;
D O I
10.1149/2.0131907jss
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The structure for beta-Ga2O3/Graphene and beta-Ga2O3/BP heterostructure MOSFET has been proposed and investigated for the first time in this work. The RF performance of proposed structure was analyzed and compared with the experimental results of the conventional beta-Ga2O3 MOSFET. The key RF figure of merits (FOMs) such as transconductance (g(m)), cutoff frequency (f(T)), output power (P-OUT), power Gain (G(P)) and power added efficiency (PAE) is obtained for the above proposed structure. The large signal RF performance analysis of earlier proposed structure has also been carried out in this work by using CWClass-A power measurement at the frequency of 0.8 GHz using passive load and source tuning. This work elucidate the use of beta-Ga2O3/Graphene and beta-Ga2O3/BP heterostructure MOSFETs, for efficient monolithic and heterogeneous integration of RF circuits. (C) The Author(s) 2019. Published by ECS.
引用
收藏
页码:Q3058 / Q3063
页数:6
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