Enhanced adhesion of plasma-sputtered copper films on polyimide substrates by oxygen glow discharge for microelectronics

被引：50

作者：

Lin, Y. -S. ^{[1
]}

Liu, H. -M. ^{[1
]}

机构：

[1] Feng Chia Univ, Dept Chem Engn, Taichung 407, Taiwan

来源：

THIN SOLID FILMS | 2008年 / 516卷 / 08期

关键词：

adhesion; polymer; metallization; oxygen plasma; XPS; X-ray pholoelectron spectroscopy; atomic force microscopy;

D O I：

10.1016/j.tsf.2007.07.162

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Enhanced plasma-sputtered copper film adhesion onto polyimide substrates treated by oxygen glow discharge was investigated. The peel test demonstrates this improvement, with peel strengths of 0.7-1.2 g/mm for copper films prepared on un-modified polyimide substrates and 195.5-262.2 g/mm for copper films on oxygen plasma-modified polyimide substrates at certain plasma conditions. The enhanced adhesive strengths of plasma-sputtered copper films onto polyimide substrates by oxygen plasmas are due mainly to the increased surface energies of the polyimide substrates. Contact angle measurements indicate that the surface energies of polyimide substrates were greatly increased by oxygen plasmas. X-ray photoelectron spectroscopy analysis shows that the increased surface energies of polyimide substrates using oxygen plasmas occur because of the increased oxygen surface concentration and the increased C-O bond proportion. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：1773 / 1780

页数：8

共 15 条

[1] OXYGEN PLASMA MODIFICATION OF POLYIMIDE WEBS - EFFECT OF ION-BOMBARDMENT ON METAL ADHESION [J].