Investigation on optical properties of CVD films used in MOEMS applications

被引：16
|
作者：
Modreanu, M [1 ]
Gartner, M [1 ]
机构：
[1] Natl Inst Res & Dev Microtechnol, Bucharest 72225, Romania
来源：
JOURNAL OF MOLECULAR STRUCTURE | 2001年 / 565卷
关键词：
APCVD; LPCVD; SiON; BPSG; optical properties;
D O I：
10.1016/S0022-2860(00)00907-8
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Low-pressure chemical vapour deposition (LPCVD) amorphous silicon oxynitride (a-SiOxNy) thin films of various compositions as well as the atmospheric pressure chemical vapour deposition (APCVD) borophosphosilicate glass (BPSG) thin films with varying phosphorus and boron contents were investigated. The dependence of the optical properties of the films on the deposition temperature and the gas flow ratio was studied by spectroellipsometry (SE) and infrared spectroscopy (IR). (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：519 / 523
页数：5
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