Ultra-high sensitivity intra-grain poly-diamond piezoresistors

被引:48
作者
Sahli, S
Aslam, DM [1 ]
机构
[1] Michigan State Univ, Dept Elect Engn, E Lansing, MI 48823 USA
[2] Michigan State Univ, Ctr Fundamental Mat Res, E Lansing, MI 48823 USA
关键词
diamond films; chemical vapor deposition; piezoresistive sensors; intra-grain sensors; high sensitivity sensors;
D O I
10.1016/S0924-4247(98)00181-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Chemical vapor deposited (CVD) polycrystalline diamond is inexpensive and can become a commercially viable piezoresistive sensor material if its typical gauge factor (GF) exceeds that of crystalline Si and SE. In this paper, a study of GF of B-doped polycrystalline diamond film leads to an intra-grain GF above 4000, which is comparable to GF of single crystal p-type diamond. This result, reported for the first time, shows that large-grain (50-80 mu m) CVD diamond can be used to build inexpensive ultra-high sensitivity piezoresistive sensors. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:193 / 197
页数:5
相关论文
共 11 条
[1]   PIEZORESISTIVITY IN VAPOR-DEPOSITED DIAMOND FILMS [J].
ASLAM, M ;
TAHER, I ;
MASOOD, A ;
TAMOR, MA ;
POTTER, TJ .
APPLIED PHYSICS LETTERS, 1992, 60 (23) :2923-2925
[2]  
DAVIDSON JL, 1994, ADV NEW DIAMOND SCI, P693
[3]  
DEGUCHI M, 1996, DIAM 96 DIAM FILMS J
[4]  
DORSCH O, 1992, DIAM 92 ICNDST 3 HEI
[5]  
EXNER HE, 1988, QUANTITATIVE IMAGE A
[6]  
FELDMAN A, 1994, WORKSH CHARACTERIZIN, V3, P8
[7]   DESEGREGATION OF BORON AT THE GRAIN-BOUNDARIES OF THE IN-SITU BORON-DOPED DIAMOND FILMS [J].
HUANG, JT ;
HU, GS ;
HWANG, J ;
CHANG, H ;
LEE, LJ .
APPLIED PHYSICS LETTERS, 1995, 67 (16) :2382-2384
[8]   Nonuniform conduction in B-doped chemical vapor deposited diamond studied by intra- and intergrain measurements [J].
Sahli, S ;
Aslam, DM .
APPLIED PHYSICS LETTERS, 1997, 70 (16) :2129-2131
[9]   PIEZORESISTIVE MICROSENSORS USING P-TYPE CVD DIAMOND FILMS [J].
TAHER, I ;
ASLAM, M ;
TAMOR, MA ;
POTTER, TJ ;
ELDER, RC .
SENSORS AND ACTUATORS A-PHYSICAL, 1994, 45 (01) :35-43
[10]  
VASEASHTA AK, 1993, J INTELLIGENT MAT SY, V4, P129