Characteristics and durability of fluoropolymer thin films

被引：8

作者：

Cheneler, David ^{[2
]}

Bowen, James ^{[1
]}

Evans, Stephen D. ^{[3
]}

Gorzny, Marcin ^{[3
]}

Adams, Michael J. ^{[1
]}

Ward, Michael C. L. ^{[2
]}

机构：

[1] Univ Birmingham, Dept Chem Engn, Birmingham B15 2TT, W Midlands, England

[2] Univ Birmingham, Dept Mech Engn, Birmingham B15 2TT, W Midlands, England

[3] Univ Leeds, Dept Phys & Astron, Leeds LS2 9JT, W Yorkshire, England

来源：

POLYMER DEGRADATION AND STABILITY | 2011年 / 96卷 / 04期

基金：

英国工程与自然科学研究理事会;

关键词：

Fluoropolymer; Atomic force microscopy; X-ray photoelectron spectroscopy; Wetting; Etchant; pH; PLASMA COPOLYMERIZATION; CHEMICAL-STRUCTURE; GROWTH; OCTAFLUOROCYCLOBUTANE; TMAH;

D O I：

10.1016/j.polymdegradstab.2010.12.022

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The use of plasma-polymerised fluoropolymer (CFxOy) thin films in the manufacture of micro-electromechanical systems (MEMS) devices is well-established, being employed in the passivation step of the deep reactive ion etching (DRIE) process, for example. This paper presents an investigation of the effect of exposure to organic and aqueous liquid media on plasma-polymerised CFxOy thin films. Atomic force microscopy (AFM), scanning electron microscopy (SEM), ellipsometry, X-ray photoelectron spectroscopy (XPS) and dynamic wetting measurements were all employed as characterisation techniques. Highly basic aqueous solutions, including known silicon etchants, were found to cause delamination via degradation of the countersurface below the CFxOy thin film. Films were found to be stable in organic solvents, acidic aqueous solutions and slightly basic aqueous solutions. (C) 2011 Elsevier Ltd. All rights reserved.

引用

页码：561 / 565

页数：5

共 19 条

[1] ELECTRICAL AND STRUCTURAL STUDIES OF PLASMA-POLYMERIZED FLUOROCARBON FILMS [J].

AMYOT, N ;

KLEMBERGSAPIEHA, JE ;

WERTHEIMER, MR ;

SEGUI, Y ;

MOISAN, M .

IEEE TRANSACTIONS ON ELECTRICAL INSULATION, 1992, 27 (06) :1101-1107

[2] Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time [J].

Anderson, Christopher N. ;

Daggett, Joe ;

Naulleau, Patrick P. .

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY, 2010, 7636

[3] Hydrophobic valves of plasma deposited octafluorocyclobutane in DRIE channels [J].

Andersson, H ;

van der Wijngaart, W ;

Griss, P ;

Niklaus, F ;

Stemme, G .

SENSORS AND ACTUATORS B-CHEMICAL, 2001, 75 (1-2) :136-141

[4]

[Anonymous], 1979, Chemistry of silica-solubility, polymerization, colloid and surface properties and biochemistry

[5]

[Anonymous], ROARKS FORMULAS STRE

[6] Fabrication of PDMS stamps for the patterned growth of carbon nanotubes [J].

Argyrakis, P ;

Teo, L ;

Stevenson, T ;

Cheung, R .

MICROELECTRONIC ENGINEERING, 2005, 78-79 :647-652

[7] Etch characteristics of KOH, TMAH and dual doped TMAH for bulk micromachining of silicon [J].

Biswas, K ;

Kal, S .

MICROELECTRONICS JOURNAL, 2006, 37 (06) :519-525

[8] Wetting of low-energy surfaces [J].

Churaev, N. V. ;

Sobolev, V. D. .

ADVANCES IN COLLOID AND INTERFACE SCIENCE, 2007, 134-35 (15-23) :15-23

[9]

Elders J., 1994, Proceedings IEEE Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robotic Systems (Cat. No.94CH3404-1), P170, DOI 10.1109/MEMSYS.1994.555618

[10] The growth and characterization of photonic thin films [J].

Grant, JT ;

Jiang, H ;

Tullis, S ;

Johnson, WE ;

Eyink, K ;

Fleitz, P ;

Bunning, TJ .

VACUUM, 2005, 80 (1-3) :12-19

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