Characterization of the Solid State Properties of Anodic Oxides on Magnetron Sputtered Ta, Nb and Ta-Nb Alloys

被引:39
作者
Di Franco, F. [1 ]
Zampardi, G. [1 ]
Santamaria, M. [1 ]
Di Quarto, F. [1 ]
Habazaki, H. [2 ]
机构
[1] Univ Palermo, Fac Ingn, Electrochem Mat Sci Lab, I-90128 Palermo, Italy
[2] Hokkaido Univ, Grad Sch Engn, Sapporo, Hokkaido 0608628, Japan
关键词
PHYSICOCHEMICAL CHARACTERIZATION; PHOTOCURRENT SPECTROSCOPY; PASSIVE FILMS; GATE OXIDE; TA2O5; ADMITTANCE; CAPACITORS; CORROSION; NIOBIUM; LAYERS;
D O I
10.1149/2.031201jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Tantalum oxide, niobium oxide and Ta-Nb containing mixed oxides were grown by anodizing sputter-deposited Ta, Nb and Ta-Nb alloys of different compositions. A photoelectrochemical investigation was performed in order to estimate the band gap and the flat band potential of the oxides as a function of their composition. The band gap of the investigated Ta-Nb containing mixed oxides changed monotonically between those estimated for Ta(2)O(5) (4.1 eV) and Nb(2)O(5) (3.4 eV) and in agreement with a proposed correlation between the Band gap of an oxide and the difference of electronegativity of the oxide constituents. From the differential capacitance curves recorded in a wide range of electrode potential and for several frequencies of the alternative signal, the dielectric constant of the investigated oxides were estimated. (C) 2011 The Electrochemical Society. [DOI: 10.1149/2.031201jes]
引用
收藏
页码:C33 / C39
页数:7
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