Enhanced Surface Properties Induced by High Current Pulsed Electron Beam (HCPEB) Treatment

被引：0
作者：
Hao Shengzhi [1 ,2 ]
Wang Huihui [1 ,2 ]
Li Mincai [1 ,3 ]
Xu Yang [1 ,3 ]
Dong Chuang [1 ,3 ]
机构：
[1] Dalian Univ Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
[2] Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China
[3] Dalian Univ Technol, Sch Mat Sci & Engn, Dalian 116024, Peoples R China
来源：
RARE METAL MATERIALS AND ENGINEERING | 2011年 / 40卷
关键词：
high current pulsed electron beam; surface treatment; microstructure; property; LOW-ENERGY;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
High current pulsed electron beam (HCPEB) has been developed as a useful tool for surface treatment of materials. In the present work, the fundamental principle of HCPEB source was described along with the device configuration and working parameters. Through the different kinds of HCPEB surface treatment experiments conducted, the enhanced surface properties induced by HPCEB treatment were illustrated and explained with their microstructure characterization results.
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收藏
页码：178 / 180
页数：3
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