Formation of transition layers at metal/perovskite oxide interfaces showing resistive switching behaviors

被引:23
作者
Yamamoto, T. [1 ]
Yasuhara, R. [1 ]
Ohkubo, I. [1 ]
Kumigashira, H. [1 ,2 ,3 ]
Oshima, M. [1 ,3 ,4 ]
机构
[1] Univ Tokyo, Dept Appl Chem, Bunkyo Ku, Tokyo 1138656, Japan
[2] Japan Sci & Technol Agcy, PRESTO, Kawaguchi, Saitama 3320012, Japan
[3] Univ Tokyo, Synchrotron Radiat Res Org, Bunkyo Ku, Tokyo 1138656, Japan
[4] Japan Sci & Technol Agcy, CREST, Bunkyo Ku, Tokyo 1138656, Japan
关键词
RESISTANCE; MEMORY; FILMS;
D O I
10.1063/1.3631821
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors have investigated the chemical states at the interface of metal/perovskite oxides both with and without bipolar resistive switching (RS) behavior using photoemission spectroscopy and x-ray absorption spectroscopy. Al/Pr0.7Ca0.3MnO3 (PCMO), Al/La0.7Ca0.3MnO3 (LCMO), and Al/La0.33Sr0.67FeO3 interfaces were chosen as typical examples of interfaces for the perovskite-based resistance random access memory (ReRAM), while Pt/PCMO and Ag/LCMO were chosen as references for the metal/perovskite interface without RS behavior. Detailed analyses of spectroscopic data revealed that transition layers were formed at the interfaces showing RS behavior as a result of interfacial redox reactions between the Al electrodes and the transition metal ions in the oxides. On the other hand, for the interfaces that did not exhibit RS behavior, no chemical reaction occurred at the interface. The formation of the interfacial transition layer is naturally explained by considering the redox potential between the electrode materials and transition metal ions. These results suggest that a suitable combination of electrodes and oxides could be designed based on their redox potentials. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3631821]
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页数:7
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