XPS and AFM characterization of the self-assembled molecular monolayers of a 3-aminopropyltrimethoxysilane on silicon surface, and effects of substrate pretreatment by UV-irradiation

被引:21
作者
Cui, Nai-Yi [1 ]
Liu, Chaozong [2 ]
Yang, Wantai [3 ]
机构
[1] N China Univ Technol, Coll Sci, Dept Phys & Chem Sci, Beijing 100144, Peoples R China
[2] Robert Gordon Univ, Sch Engn, Aberdeen AB10 1FR, Scotland
[3] Beijing Univ Chem Technol, Coll Mat Sci & Engn, Beijing 100029, Peoples R China
关键词
XPS; AFM; self-assembly; 3-aminopropyltrimethoxysilane; UV-irradiation; SILANE; ADSORPTION; CHEMISTRY; DYNAMICS; INSIGHTS;
D O I
10.1002/sia.3698
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The self-assembled (SA) molecular monolayers of a 3-aminopropyltrimethoxysilane (3-APTS) on a silicon (111) surface, and the effects of ultraviolet (UV) pre-treatment for substrates on the assembling process have been studied using XPS and atomic force microscopy (AFM). The results show that the SA 3-APTS molecules are bonded to the substrate surface in a nearly vertical orientation, with a thickness of the monolayer of about 0.8-1.5 nm. The SA molecular monolayers show a substantial degree of disorder in molecular packing, which are believed to result from the interactions of amine tails in the silane molecules used with surface functionalities of the substrates, and the oxygen-containing species from the ambient. UV irradiation for silicon substrates prior to the self-assembly reaction can enhance the assembly process and hence, significantly increase the coverage of the monolayer assembled for the substrates. Copyright (C) 2010 John Wiley & Sons, Ltd.
引用
收藏
页码:1082 / 1088
页数:7
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