Interlayer coupling of Fe/Si/Fe trilayers with very thin boundary layers

被引：14

作者：

Endo, Y ^{[1
]}

Kitakami, O ^{[1
]}

Shimada, Y ^{[1
]}

机构：

[1] Tohoku Univ, Sci Measurements Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 85卷 / 08期

关键词：

D O I：

10.1063/1.370111

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The interlayer magnetic coupling of a Fe/Si/Fe trilayer shows an analogous feature to that of Fe/Si superlattices. With an increase in Si layer thickness, it oscillates as ferromagnetic (first F), antiferromagnetic (AF), ferromagnetic (second F), and finally reaches a noncoupling (N) state. We have investigated interlayer coupling of Fe/Si/Fe trilayers inserting very thin (1 or 2 ML thick) boundary layers X (X=Ag, Ge, Fe-Si, Ta, etc.). They are expected to suppress interatomic diffusion between Fe and Si layers. Interlayer coupling of Fe/X/Si/X/Fe with negligible interdiffusion is simply F and changes to N as the Si layer thickness increases. Furthermore, Fe/Fe-Si/Fe trilayers which show coupling of first F, AF but not second F, reproduce second F when a Si layer is inserted in the Fe-Si spacer. These results imply that an amorphous Si spacer mediates ferromagnetic coupling between neighboring Fe layers while the first F and the strong AF coupling usually observed in Fe/Si superlattices are caused by diffused crystalline Fe-Si. (C) 1999 American Institute of Physics. [S0021-8979(99)45508-2].

引用

页码：5741 / 5743

页数：3

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