Ellipsometry for measurement of complex dielectric permittivity in millimeter-wave region

被引：2

作者：

Tsuzukiyama, K ^{[1
]}

Sakai, T ^{[1
]}

Yamazaki, T ^{[1
]}

Hashimoto, O ^{[1
]}

机构：

[1] Mitsui Chem INC, Sodegaura, Chiba 2990265, Japan

来源：

33RD EUROPEAN MICROWAVE CONFERENCE, VOLS 1-3, CONFERENCE PROCEEDINGS | 2003年

关键词：

D O I：

10.1109/EUMA.2003.340996

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The ellipsometry method is extended to a measurement for complex permittivities of materials in millimeter-wave region. We propose an effective technique based on the Fourier analysis method to eliminate an uncertainty due to the free-space method. Complex permittivities can be measured with a high degree of accuracy by the improved ellipsometry method, as named Fourier Analysis Correction Ellipsometry (FACE) Method.

引用

页码：487 / 490

页数：4

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