Pyrolytic laser CVD of boron nitride and molybdenum

被引：5

作者：

Duty, C ^{[1
]}

Johnson, R ^{[1
]}

Bondi, S ^{[1
]}

Lackey, WJ ^{[1
]}

机构：

[1] Georgia Inst Technol, Woodruff Sch Mech Engn, Atlanta, GA 30332 USA

来源：

CHEMICAL VAPOR DEPOSITION | 2003年 / 9卷 / 06期

关键词：

D O I：

10.1002/cvde.200304159

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The pyrolytic laser chemical vapor depositon (CVD) of boron nitride and molybdenum was studied. The boron nitride was a unique ceramic material, possessing a moderate thermal conductivity and low electrical conductivity. It was shown that boron nitride also has a relatively high resistance to thermal shock and corrosion, making it an excellent candidate material for electronic devices. Each of the samples was inspected using an optical stereomicroscope and a scanning electron microscope (SEM) equipped with an energy-dispersive spectrometer, after deposition.

引用

页码：298 / 301

页数：4

共 13 条

[1] Laser chemical vapour deposition: materials, modelling, and process control [J].

Duty, C ;

Jean, D ;

Lackey, WJ .

INTERNATIONAL MATERIALS REVIEWS, 2001, 46 (06) :271-287

[2]

Duty C. E., 1999, CERAM ENG SCI P, V20, P347

[3]

DUTY CE, 2001, THESIS GEORGIA I TEC

[4]

FUHRMAN B, 2000, THESIS GEORGIA I TEC

[5]

Hurwitz F.I., 2000, CER ENG SCI P AM CER, P267, DOI 10.1002/

[6]

Jean DL, 1999, SOL FREEFORM FABRIC, P59

[7]

JEAN DL, 2001, THESIS GEORGIA I TEC

[8] HIGH-PRESSURE PHASES OF BORON-NITRIDE GROWN BY LASER-ASSISTED PLASMA CHEMICAL VAPOR-DEPOSITION FROM BCL3+NH3+H-2+AR [J].

KOMATSU, S ;

MORIYOSHI, Y ;

KASAMATSU, M ;

YAMADA, K .

JOURNAL OF APPLIED PHYSICS, 1991, 70 (11) :7078-7084

[9] KINETIC-ANALYSIS OF CHEMICAL VAPOR-DEPOSITION OF BORON-NITRIDE [J].

LEE, WY ;

LACKEY, WJ ;

AGRAWAL, PK .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1991, 74 (10) :2642-2648

[10] DENSITY AND DEPOSITION RATE OF CHEMICAL-VAPOR-DEPOSITED BORON-NITRIDE [J].

MATSUDA, T ;

NAKAE, H ;

HIRAI, T .

JOURNAL OF MATERIALS SCIENCE, 1988, 23 (02) :509-514

← 1 2 →