Preparation of sputtered (Bax,Sr1-x)TiO3 thin films directly on copper

被引:29
作者
Laughlin, B [1 ]
Ihlefeld, J [1 ]
Maria, JP [1 ]
机构
[1] N Carolina State Univ, Dept Mat Sci & Engn, Electroceram Thin Films Grp, Raleigh, NC 27695 USA
关键词
D O I
10.1111/j.1551-2916.2005.00488.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
(Ba-0.6,Sr-0.4)TiO3 (BST) films were deposited on copper foils by radio frequency magnetron sputtering. By the use of controlled pO(2) high-temperature anneals, the films were completely crystallized in the absence of substrate oxidation. X-ray diffraction and transmission electron microscopy (TEM) revealed an abrupt Cu/BST interface. The deposited BST films exhibit a zero bias permittivity and loss tangent values of 600 and 0.018, respectively. An electrical tunability ratio of 3.5:1 is observed on these metal-insulator-metal devices. Devices show leakage currents of 10(-8) A/cm(2) at +/- 10 V/mu m, and loss tangents as low as 0.003 in fields approaching 40 V/mu m.
引用
收藏
页码:2652 / 2654
页数:3
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