Memory Reliability Estimation Degraded by TDDB Using Circuit-Level Accelerated Life Test

被引:0
作者
Kim, Dae-Hyun [1 ]
Milor, Linda [1 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
来源
2017 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS) | 2017年
关键词
accelerated life test; front-end/middle/back-end-of-the-line time-dependent dielectric breakdown; static random access memory; design of experiments; lifetime; simulation; reliability;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As memory technology scales down, memory cells tend to become unreliable. To guarantee reliable operations of circuits and systems, semiconductor devices are tested with accelerated life tests to estimate device-level reliability and to develop a predictive reliability model for circuits and systems based on the estimated reliability of devices. However, to accurately estimate the lifetime of a system, accelerated lifetime testing at the system level is necessary. In this paper, we propose a system-level accelerated life test plan. As a case study, we investigate the reliability of SRAMs under time-dependent dielectric breakdown, one of the major contributors to aging failures in modern computer systems. Using the simulation results, we examine failure trends at various stress conditions for the system-level accelerated life test. From the resulting observations, we suggest a method that optimizes the experimental design of system-level accelerated life tests.
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页数:6
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