La/B4C small period multilayer interferential mirror for the analysis of boron

被引：32

作者：

André, JM

Jonnard, P

Michaelsen, C

Wiesmann, J

Bridou, F

Ravet, MF

Jérome, A

Delmotte, F

Filatova, EO

机构：

[1] Univ Paris 06, CNRS, UMR 7614, LCPMR,Lab Chim Phys Mat & Rayonnement, F-75231 Paris, France

[2] Incoatec GmbH, D-21502 Geesthacht, Germany

[3] CNRS, UMR 8501, Inst Opt, Lab Charles Fabry,Ctr Sci,Grp Phys Films Minces, F-91403 Orsay, France

[4] St Petersburg State Univ, Inst Phys, St Petersburg 198904, Russia

来源：

X-RAY SPECTROMETRY | 2005年 / 34卷 / 03期

关键词：

D O I：

10.1002/xrs.793

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

An La/B4C multilayer interferential mirror with small period d (4.8 nm) was produced by diode sputtering for the detection of the boron K emission by wavelength-dispersive x-ray spectrometry at a large Bragg angle (close to 45°). The structure of the mirror was characterized by grazing incidence x-ray reflectometry and its performance at the energy of the boron K emission (183 eV) was evaluated by means of polarized synchrotron radiation. Spectrometric measurements showed that the La/B4C mirror improved the detection limit of boron using by a factor of 2 with respect to similar Mo/B4C mirrors and by a factor of 4 with respect to a lead stearate crystal. Copyright © 2005 John Wiley & Sons, Ltd.

引用

页码：203 / 206

页数：4

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