Comparative Study of Cathode and Magnetron Sputtering Methods for Depositing Pb(TiZr)O3 Ferroelectric Film

被引：7

作者：

Beshenkov, V. G. ^{[1
]}

Znamenskii, A. G. ^{[1
]}

Marchenko, V. A. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Microelect Technol & High Pur Mat, Chernogolovka 142432, Moscow Oblast, Russia

来源：

JOURNAL OF SURFACE INVESTIGATION-X-RAY SYNCHROTRON AND NEUTRON TECHNIQUES | 2010年 / 4卷 / 05期

关键词：

Neutron Technique; Magnetron Sputtering; Film Composition; Ferroelectric Film; Target Composition;

D O I：

10.1134/S1027451010050101

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The radial distribution of the composition and thickness of lead zirconate titanate films deposited in several modes of magnetron and diode sputtering was measured. It was shown that the effects of deposited film resputtering with preferential lead sputtering are pronounced during ion-plasma sputtering of Pb(Zr,Ti)O-3. During magnetron sputtering, this leads to a nonuniform distribution of the film composition over the substrate, which cannot be compensated by varying the target composition. During diode sputtering with a short target-substrate distance, resputtering has no significant effect on the film composition.

引用

页码：758 / 760

页数：3