Characterization of the surface changes and the aging effects of low-pressure nitrogen plasma treatment in a polyurethane film

被引:121
作者
Sanchis, M. R. [2 ]
Calvo, O. [2 ]
Fenollar, O. [1 ]
Garcia, D. [1 ]
Balart, R. [1 ]
机构
[1] Univ Politecn Valencia, Higher Polytech Sch Alcoy, Dept Mech & Mat Engn, Alicante 03801, Spain
[2] Text Res Inst AITEX, Alicante 03801, Spain
关键词
surface modification; X-ray photoelectron spectroscopy (XPS); contact angle; atomic force microscopy (AFM); low-pressure plasma; polyurethane film;
D O I
10.1016/j.polymertesting.2007.09.002
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this work, low-pressure nitrogen plasma has been used to improve wettability in a polyurethane film. Evaluation of wettability changes has been carried out using contact angle measurements. Furthermore, plasma-treated films have been subjected to air aging to evaluate the extent of hydrophobic recovery. X-ray photoelectron spectroscopy (XPS) has been used to study surface functionalization; surface topography changes related with the etching mechanism have been followed by scanning electron microscopy (SEM), atomic force microscopy (AFM) and weight loss study. The results show a considerable improvement in surface wettability even for short exposure times, as observed by a remarkable decrease in contact angle values. The aging study shows a partial hydrophobic recovery due to the re-arrangement of polar species and migration of low molecular oxidized material (LMWOM). In addition to surface activation, SEM and AFM analyses show slight changes in surface topography as a consequence of the plasma-etching mechanism. (C) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码:75 / 83
页数:9
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