Fabrication of stamps for microcontact printing by injection molding

被引:13
作者
Chandekar, Amol [1 ]
Alabran, Michael [1 ]
Sengupta, Sandip K. [1 ]
Lee, Jun S. [1 ]
Mead, Joey L. [1 ]
Barry, Carol M. F. [1 ]
Whitten, James E. [1 ]
Somu, Sivasubramanian [2 ]
Busnaina, Ahmed A. [2 ]
机构
[1] Univ Massachusetts, Ctr High Rate Nanomfg, Lowell, MA 01854 USA
[2] Northeastern Univ, Ctr High Rate Nanomfg, NSF Nanoscale Sci & Engn, Boston, MA 02115 USA
基金
美国国家科学基金会;
关键词
microinjection molding; microcontact printing; soft lithography; silicon mold;
D O I
10.1016/j.mee.2007.05.008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Microcontact printing has been shown to be a viable lithographic technique for the fabrication of a variety of microelectronic components, including source/drain and gate electrodes for organic field effect transistors. Future manufacturing efforts may require a means of mass producing stamps for this process. In the present work, stamps for microcontact printing were rapidly produced by injection molding a commercial polyurethane resin, using a silicon master as the mold insert. The performance of these stamps was evaluated by microcontact printing gold coated silicon surfaces with a fluorinated alkanethiol. Etching of the stamped surface protected by the patterned alkanethiol revealed excellent replication of the submicron linear features of the micromold. The use of injection molding as a standard method for the production of stamps for microcontact printing is proposed and may have advantages for future nanotechnology applications that require mass production of stamps. Because a wide range of polymers may be injection molded, this method may make possible the fabrication of stamps with improved mechanical and chemical properties compared to polydimethylsiloxane based stamps. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:187 / 194
页数:8
相关论文
共 44 条
[1]   Fabrication of PDMS stamps for the patterned growth of carbon nanotubes [J].
Argyrakis, P ;
Teo, L ;
Stevenson, T ;
Cheung, R .
MICROELECTRONIC ENGINEERING, 2005, 78-79 :647-652
[2]  
*BAYER MATERIALSCI, 2002, TEXIN 985 PROD INF
[3]   Microcontact printing process of individual for the patterned growth CNTs [J].
Casimirius, S ;
Flahaut, E ;
Laberty-Robert, C ;
Malaquin, L ;
Carcenac, F ;
Laurent, C ;
Vieu, C .
MICROELECTRONIC ENGINEERING, 2004, 73-4 :564-569
[4]   Photopatternable silicon elastomers with enhanced mechanical properties for high-fidelity nanoresolution soft lithography [J].
Choi, KM .
JOURNAL OF PHYSICAL CHEMISTRY B, 2005, 109 (46) :21525-21531
[5]   A photocurable poly(dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime [J].
Choi, KM ;
Rogers, JA .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (14) :4060-4061
[6]   Microcontact printing of macromolecules with submicrometer resolution by means of polyolefin stamps [J].
Csucs, G ;
Künzler, T ;
Feldman, K ;
Robin, F ;
Spencer, ND .
LANGMUIR, 2003, 19 (15) :6104-6109
[7]   Stability of molded polydimethylsiloxane microstructures [J].
Delamarche, E ;
Schmid, H ;
Michel, B ;
Biebuyck, H .
ADVANCED MATERIALS, 1997, 9 (09) :741-746
[8]  
*DOW CORN CORP, 2005, INF DOW CORN SIL ENC
[9]  
*DOW CORN CORP, 2003, INF DOW CORN SIL ENC
[10]  
*DOW CORN CORP, 2001, INF DOW CORN SIL ENC