The evaluation of autothermal methane reforming for hydrogen production over Ni/CeO2 catalysts

被引:48
作者
Sepehri, Soodeh [1 ,2 ]
Rezaei, Mehran [2 ,3 ]
Wang, Yuan [4 ]
Younesi, Aryan [5 ]
Arandiyan, Hamidreza [6 ]
机构
[1] Islamic Azad Univ, Kashan Branch, Young Researchers & Elite Club, Kashan, Iran
[2] Univ Kashan, Chem Engn Dept, Catalyst & Adv Mat Res Lab, Fac Engn, Kashan, Iran
[3] Univ Kashan, Inst Nanosci & Nanotechnol, Kashan, Iran
[4] Univ New South Wales, Sch Chem, Sydney, NSW 2052, Australia
[5] Tafresh Univ, Chem Engn Fac, Tafresh, Iran
[6] Univ Sydney, Sch Chem, Lab Adv Catalysis Sustainabil, Sydney, NSW 2006, Australia
关键词
Autothermal reforming; Methane conversion; Synthesis gas production; Ni supported catalyst; Sintering; MESOPOROUS NANOCRYSTALLINE GAMMA-AL2O3; SUPPORTED RHODIUM CATALYSTS; NI CATALYSTS; CARBON-DIOXIDE; SYNTHESIS GAS; ALUMINA; CERIA; CE; DEACTIVATION;
D O I
10.1016/j.ijhydene.2018.10.016
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Nanocrystalline Ni/CeO2 catalysts with various loadings of Ni (10, 15, 20, and 25%) were synthesised by a facile solvent deficient precipitation method for methane autothermal reforming process. The characterisation techniques such as XRD, BET, TPH, H-2-TPR were carried out on fresh and spent samples to investigate the catalytic properties of the Ni/CeO2. On the basis of characterisation results, the 20% Ni/CeO2 performs the best activity among the catalysts with different Ni contents. The optimal reaction conditions for autothermal methane reforming has been investigated by evaluating the effect of reaction parameters including the reactivity temperature, the gas hourly space velocity (GHSV) and H2O/CH4 (S/C) and O-2/CH4 (O/C) molar ratios. The stability of 20 wt% Ni/CeO2 catalyst at 700 degrees C is examined for 20 h on-stream reaction. It reveals that the methane conversion starts a graduate decrease trend from the second 10 h, which is found to be because of the sintering of Ni nanoparticles by TPH and BET analysis. (C) 2018 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:22340 / 22346
页数:7
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