LiNbO3 films of high epitaxial quality and with thicknesses of 120-500 nm were deposited at 650 degrees C on C-sapphire by atmospheric pressure metal-organic chemical vapour deposition. Li nonstoichiometry, residual stresses, twinning, and thermal expansion of the films as a function of the film thickness were investigated by means of Raman spectroscopy and X-ray diffraction. The relaxation of residual stresses, Li2O loss, inelastic deformation and elastic hysteresis during cycles of heating up to 860 degrees C and cooling down to room temperature were studied, as well. The residual stresses and thermal expansion of films were highly thickness dependent. It was shown that the {01 (1) over bar2} twinning contributed to the stress relaxation in the thick LiNbO3 films. (C) 2014 Elsevier B.V. All rights reserved.
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Univ Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Bartasyte, A.
Plausinaitiene, V.
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Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Plausinaitiene, V.
Abrutis, A.
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Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Abrutis, A.
Murauskas, T.
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Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Murauskas, T.
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Boulet, P.
Margueron, S.
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Univ Lorraine, Lab Mat Opt Photon & Syst, SUPELEC, EA 4423, F-57070 Metz, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Margueron, S.
Gleize, J.
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Univ Lorraine, LCP A2MC, EA 4632, F-57078 Metz, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Gleize, J.
Robert, S.
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Univ Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Robert, S.
Kubilius, V.
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Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Kubilius, V.
Saltyte, Z.
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Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
机构:
Univ Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Bartasyte, A.
Plausinaitiene, V.
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h-index: 0
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Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Plausinaitiene, V.
Abrutis, A.
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h-index: 0
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Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Abrutis, A.
Murauskas, T.
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h-index: 0
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Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Murauskas, T.
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Boulet, P.
Margueron, S.
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h-index: 0
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Univ Lorraine, Lab Mat Opt Photon & Syst, SUPELEC, EA 4423, F-57070 Metz, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Margueron, S.
Gleize, J.
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h-index: 0
机构:
Univ Lorraine, LCP A2MC, EA 4632, F-57078 Metz, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Gleize, J.
Robert, S.
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h-index: 0
机构:
Univ Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Robert, S.
Kubilius, V.
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h-index: 0
机构:
Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France
Kubilius, V.
Saltyte, Z.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Vilnius, Dept Gen & Inorgan Chem, LT-03225 Vilnius, LithuaniaUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54011 Nancy, France