A comparison of Ge-H and Si-H bond activation with group VI agostic complexes.

被引：0
|
作者：
Vincent, J [1 ]
Luo, XL [1 ]
Scott, BL [1 ]
Kubas, GJ [1 ]
机构：
[1] Univ Calif Los Alamos Natl Lab, Chem Sci & Technol Div, Los Alamos, NM 87545 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1998年 / 216卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
092-INOR
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页码：U27 / U27
页数：1
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