silicon carbide;
field effect transistor;
simulation;
microwave;
D O I:
10.1016/j.sse.2007.06.013
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
DC and small-signal electro-thermal simulations of a 4H-SiC microwave power MESFET on a high purity semi-insulating substrate are compared to measurements. The focus is on the electron transport, substrate traps, and thermal heating. The doping concentrations are described by measured SIMS profiles, and the material parameters are in accordance with published results. Although the simulated MESFET has a p-buffer and a high purity substrate, the simulations show that the density of shallow traps affects the device characteristics. The very good agreement between simulated and measured DC and small-signal characteristics indicates that the models for electron mobility, substrate traps, and heating are the most important to achieve good agreement with measured data. (c) 2007 Elsevier Ltd. All rights reserved.
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Xu, Tingxiang
Liu, Xuechao
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Liu, Xuechao
Zhuo, Shiyi
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Zhuo, Shiyi
Huang, Wei
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Huang, Wei
Gao, Pan
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Gao, Pan
Xin, Jun
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Xin, Jun
Shi, Erwei
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Xu, Tingxiang
Liu, Xuechao
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Liu, Xuechao
Zhuo, Shiyi
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Zhuo, Shiyi
Huang, Wei
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Huang, Wei
Gao, Pan
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Gao, Pan
Xin, Jun
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
Xin, Jun
Shi, Erwei
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China