Induced NH2 bonding of carbon nanotubes using NH3 plasma-enhanced chemical vapor deposition

被引:6
作者
Chiou, Ai-Huei [2 ]
Chang, Yu-Ming [3 ]
Wu, Wen-Fa [4 ]
Chou, Chang-Ping [2 ]
Hsu, Chun-Yao [1 ]
机构
[1] Lunghwa Univ Sci & Technol, Dept Mech Engn, Kueishan, Taiwan
[2] Natl Chiao Tung Univ, Dept Mech Engn, Hsinchu, Taiwan
[3] Atom Energy Council, Inst Nucl Energy Res, Tao Yuan, Taiwan
[4] Natl Nano Device Labs, Hsinchu, Taiwan
关键词
SURFACE MODIFICATION; FUNCTIONALIZATION; PRETREATMENT; TEMPERATURE; COATINGS; GROWTH; FILMS;
D O I
10.1007/s10854-011-0514-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Plasma-enhanced chemical vapor deposition was used to modify the multiwall carbon nanotubes (MWCNTs) using ammonia (NH3) plasma. For various durations of NH3 plasma treatment, a scanning electron microscope, X-ray, Raman spectroscopy and contact angle measurement were used to ascertain several characteristics of the MWCNTs. The experimental results show that: (1) the length of the MWCNTs is reduced, if the duration of the plasma treatment is increased; (2) the NH3 plasma treatment can incorporate amine (NH2-) or amino (NH-) functional groups onto the MWCNT surface; (3) the plasma treated carbon nanotubes become more hydrophilic.
引用
收藏
页码:889 / 896
页数:8
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