Photoelectrochemical and physical properties of tungsten trioxide films obtained by aerosol pyrolysis

被引：29

作者：

Sadale, S. B. ^{[1
]}

Chaqour, S. M. ^{[1
]}

Gorochov, O. ^{[1
]}

Neumann-Spallart, M. ^{[1
]}

机构：

[1] CNRS, Grp Etud Mat Condensee, F-92195 Meudon, France

来源：

MATERIALS RESEARCH BULLETIN | 2008年 / 43卷 / 06期

关键词：

semiconductors; thin films; oxides; electrochemical properties;

D O I：

10.1016/j.materresbull.2007.06.035

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Aerosol pyrolysis (AP) was used for preparing semiconducting films of tungsten trioxide using peroxotungstic acid as a precursor. The films were characterized by SEM, XRD, and by their photoelectrochemical response. Porous, polycrystalline (monoclinic) films of thickness up to 3 mu m were prepared. An incident photon to current efficiency (IPCE) of 0.55 at 365 nm was obtained for films of 1 mu m thickness on conducting F:SnO2/glass substrates under depiction conditions, in junctions with aqueous electrolytes. The spectral (photocurrent) response extended into the visible region (up to 470 nm) which is of importance for solar applications like photocatalysis. (C) 2007 Elsevier Ltd. All rights reserved.

引用

页码：1472 / 1479

页数：8

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