Massive reduction of threading screw dislocations in 4H-SiC crystals grown by a hybrid method combined with solution growth and physical vapor transport growth on higher off-angle substrates

被引:11
作者
Mitani, Takeshi [1 ]
Eto, Kazuma [1 ]
Momose, Kenji [2 ]
Kato, Tomohisa [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058569, Japan
[2] Showa Denko Co Ltd, Minato Ku, Tokyo 1058518, Japan
关键词
SURFACE-MORPHOLOGY; SUBLIMATION GROWTH; SINGLE-CRYSTALS; GENERATION; DEFECTS;
D O I
10.35848/1882-0786/ac15c1
中图分类号
O59 [应用物理学];
学科分类号
摘要
Propagation of threading screw dislocations (TSDs) during hybrid growth, combined with TSD conversion by solution growth and bulk growth by physical vapor transport, has been investigated for 4 degrees off and 15 degrees off (000 (1) over bar) C-face seeds. The converted defects on basal planes (BP-defects) are able to be eliminated by continuing to guide them on basal planes with a 15 degrees off seed, while BP-defects revert to TSDs with a 4 degrees off seed. The difference in the BP-defects propagation is discussed based on the elastic energy balance between TSDs and BP-defects in the unit growth thickness for higher off-angle seeds. (C) 2021 The Japan Society of Applied Physics
引用
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页数:4
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