Dependence of DAP emission properties on impurity concentrations in N-/B-co-doped 6H-SiC

被引:5
作者
Murata, Satoshi [1 ]
Nakamura, Yoshihiro [1 ]
Maeda, Tomohiko [1 ]
Shibata, Yoko [1 ]
Ikuta, Mina [1 ]
Sugiura, Masaaki [1 ]
Nitta, Shugo [1 ]
Iwaya, Motoaki [1 ]
Kamiyama, Satoshi [1 ]
Amano, Hiroshi [1 ]
Akasaki, Isamu [1 ]
Yoshimoto, Masahiro [2 ]
Furusho, Tomoaki [3 ]
Kinoshita, Hiroyuki [3 ]
机构
[1] Meijo Univ, Fac Sci & Technol, Tempaku Ku, 1-501 Shiogamaguchi, Nagoya, Aichi 4688502, Japan
[2] Kyoto Inst Technol, Cooperat Res Ctr, Sakyo Ku, Kyoto 6068585, Japan
[3] SiXON Ltd, Ukyo Ku, Kyoto 6158686, Japan
来源
SILICON CARBIDE AND RELATED MATERIALS 2006 | 2007年 / 556-557卷
关键词
DAP; optical property; light-emitting diode; photoluminescence; doping concentration;
D O I
10.4028/www.scientific.net/MSF.556-557.335
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The dependence of donor-acceptor pair (DAP) emission properties on impurity concentrations of N and B in 6H-SiC epilayers was investigated. Doped samples were grown by closed sublimation technique, and impurity concentrations were confirmed by secondary ion mass spectrometry (SIMS). Photo luminescence (PL) measurement results indicate that p-type 6H-SiC with N-A > N-D had extremely low DAP emission efficiency, whereas n-type 6H-SiC with N-A < N-D showed intense DAP emission. Moreover, n-type 6H-SiC with high N and B concentrations exceeding 10(18)cm(-3) is preferable for high DAP emission efficiency.
引用
收藏
页码:335 / +
页数:2
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