Theoretical study on reaction of SiH3 with NO2

被引:0
|
作者
Dai, GL [1 ]
Wang, YC
Geng, ZY
Lü, LL
Wang, DM
机构
[1] NW Normal Univ, Dept Chem, Lanzhou 730070, Peoples R China
[2] Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China
关键词
reaction mechanism; silyl radicals; nitrogen dioxide; density functional theory (DFT);
D O I
暂无
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
The reaction between silyl radicals and nitric oxide was studied by using the B3LYP/6-311G** and the high-level electron-correlation CCSD (T) /6-311G** methods. The geometries for reactants, the transition states and the products were completely optimized. All the transition states are verified by the vibrational analysis and the intrinsic reaction coordinate (IRC) calculations. The results show that the reaction is via multi-channel and multistep. Five products may be formed via the complex reaction channels, i.e. association, H-shift and dissociation.
引用
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页码:522 / 526
页数:5
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