A Novel IGBT With High-k Dielectric Modulation Achieving Ultralow Turn-Off Loss

被引:7
|
作者
Chen, Weizhen [1 ]
Chen, Junji [1 ]
Chen, Xing Bi [1 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
基金
中国国家自然科学基金;
关键词
Carrier stored layer (CSL); dielectric modulation; field stop (FS) layer; high relative dielectric constant (high-k; HK); material; insulated gate bipolar transistor (IGBT); turn-off loss; SUPERJUNCTION IGBT; MOSFET; TRENCH; FILM;
D O I
10.1109/TED.2020.2964879
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel insulated gate bipolar transistor modulated by a high-k dielectric (HK-IGBT) is presented. By laterally alternating the HK-pillar and N-drift, HK-IGBT can offer a quick and complete depletion to the drift region during the turn-off transient. This merit greatly reduces the current varying time of an HK-IGBT. Moreover, HK-IGBT can obtain a better electric field distribution, which enables the carrier stored layer (CSL) to have a higher doping dose when compared to a typical carrier stored trench gate bipolar transistor (CSTBT). These advantages improve the relationship between the static and transient power losses. According to the simulation results, HK-IGBT obtains a 66% lower turn-off loss than that of a field stop (FS) IGBT with the same ON-state voltage. Moreover, by using a CSL, the performance of an HK-IGBT can be comparable with that of a super-junction IGBT (SJ-IGBT).
引用
收藏
页码:1066 / 1070
页数:5
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