Effect of current density on electrodeposited cobalt ferrous tungsten magnetic thin films
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Christy, T. Aruna
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Vivekanandha Coll Engn Women, Dept Phys, Tiruchengode 637205, Tamil Nadu, IndiaVivekanandha Coll Engn Women, Dept Phys, Tiruchengode 637205, Tamil Nadu, India
Christy, T. Aruna
[1
]
Thangaraj, N.
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Velalar Coll Engn & Technol, Dept Phys, Erode 638012, Tamil Nadu, IndiaVivekanandha Coll Engn Women, Dept Phys, Tiruchengode 637205, Tamil Nadu, India
Thangaraj, N.
[2
]
Sasikumar, D.
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Arignar Anna Govt Arts Coll, Dept Phys, Namakkal 637002, Tamil Nadu, IndiaVivekanandha Coll Engn Women, Dept Phys, Tiruchengode 637205, Tamil Nadu, India
Sasikumar, D.
[3
]
机构:
[1] Vivekanandha Coll Engn Women, Dept Phys, Tiruchengode 637205, Tamil Nadu, India
[2] Velalar Coll Engn & Technol, Dept Phys, Erode 638012, Tamil Nadu, India
[3] Arignar Anna Govt Arts Coll, Dept Phys, Namakkal 637002, Tamil Nadu, India
Co-Fe-W electrodeposited magnetic thin film properties were studied to identify the possible applications in different area. The film was prepared using the electrodeposition method with different current densities, in order to get the uniform deposition with different thickness. A vibrating sample magnetometer studies provide the value of magnetic saturation (Ms=0.112emu), retentivity (Mr=0.020emu) and coercivity (Hc=88.95Oe). The prepared film is (45min, thickness is 3.10 mu m) more suitable to develop tiny integrated memory devices. X-ray diffraction studies (XRD) confirm the cubic crystalline nature of the prepared thin films. Surface morphology analysis clearly shows the uniform thickness (0.2 mu m) of the thin film [scanning electron microscope (SEM)]. The highest percentage of Co, Fe and W composition in the thin films were obtained by using energy dispersive X-ray analysis. The maximum hardness value is 212/7.5 mAcm(-2) for 45min and best adhesion with desirable magnetic properties have been reported in the present communication.
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Bhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
Ghosh, S. K.
Bera, T.
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Natl Inst Technol, Dept Met Engn & Mat Sci, Rourkela 769008, Orissa, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
Bera, T.
Saxena, C.
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Bhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
Saxena, C.
Bhattacharya, S.
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Bhabha Atom Res Ctr, Tech Phys & Prototype Engn Div, Bombay 40085, Maharashtra, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
Bhattacharya, S.
Dey, G. K.
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Bhabha Atom Res Ctr, Div Mat Sci, Bombay 40085, Maharashtra, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
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Bhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
Ghosh, S. K.
Bera, T.
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Natl Inst Technol, Dept Met Engn & Mat Sci, Rourkela 769008, Orissa, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
Bera, T.
Saxena, C.
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Bhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
Saxena, C.
Bhattacharya, S.
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Bhabha Atom Res Ctr, Tech Phys & Prototype Engn Div, Bombay 40085, Maharashtra, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India
Bhattacharya, S.
Dey, G. K.
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Bhabha Atom Res Ctr, Div Mat Sci, Bombay 40085, Maharashtra, IndiaBhabha Atom Res Ctr, Mat Proc Div, Bombay 40085, Maharashtra, India